METHOD AND APPARATUS FOR SURFACE TREATMENT

摘要

PURPOSE:To execute good-quality surface treatment at a high speed by forming LTE discharge in a magnetic field at the time of guiding the radiation light and active species generated by the plasma of the LTE discharge to a substrate surface and making the surface treatment. CONSTITUTION:A discharge gas and reaction gas are respectively introduced through valves 12, 24 into a discharge chamber 10 and a reaction chamber 20 and are discharged in an arrow 35 direction. A high-frequency voltage of a power supply 1 is impressed to a magnet 3 to generate the discharge in a space 15 for discharge and to form LTE plasma 5 so that the discharge light 42 and active seed 41 are generated in the discharge chamber 10. The magnetic field of the prescribed intensity is provided by the magnet 4 in the space 5 for discharge at this time to facilitate the formation and maintenance of the LTE plasma 5. On the other hand, the reaction gas is ejected through small holes 23 of an introducing ring 22 onto the surface of the substrate 31 in the reaction chamber 20 and the active species 41 or radiation light 42 from the LTE plasma 5 is introduced through a meshed electrode 14 onto the surface of the substrate 31. The strong radiation light 42 and the active species 41 having high purity or either thereof is thereby stably formed by the low electric power and the good-quality surface treatment is executed at a high speed.