| 摘要 |
PURPOSE:To miniaturize a device by arranging a reflector forming a specific angle from a film exposing surface on a position opposed to the film exposing surface and arranging a light source on a position allowing the film exposing surface to be pracitcally vertically irradiated by the optical axis of converged light reflected by the reflector. CONSTITUTION:The reflector 4 is arranged on the position opposed to the flm exposing surface 3 so as to form 20-40 deg. angle from the exposing surface 3 and the light source 5Aa is arranged on the position allowing the exposing surface 3 to be practically vertically irradiated by the optical axis Fc2 of con verged light reflected by the reflector. Thereby, the distance between the light source 5Aa and the reflector 4 can be shortened in the face direction parallel with the exposing surface. Consequently, the exposing device for photoengraving can be miniaturized. |
