| 摘要 |
PURPOSE:To laminate a sample to uniform thickness by periodically changing the amt. of an irradiation beam at the time of laminating a sample joined with a dissimilar material by projecting the ion beam from an oblique direction while rotating said sample. CONSTITUTION:The sample 11 in which a WSi layer 2 is stuck together to a GaAs layer 1 by an adhesive 3 is laminated to prepare a permeable sample for an electron microscope. At this time, barriers 18, 19; 20, 21 of the same shape having a part of the shape of a cylindrical face are provided on the top and bottom of a supporting disk which supports the sample 11, and said ion beam is intermittently cut off to intermittently project against the sample 11 when the disk is rotated and the Ar ion beam is obliquely projected. The ion beam can be projected only when a level difference accords to a well- shavable rotary angle and the sample 11 is uniformly laminated, by the above- mentioned manner.
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