| 摘要 |
PURPOSE:To correct the looseness of corner parts due to the lack of exposure by adding recessed corner parts to be adjusting fine patterns to a photomask in case of forming a photoresist pattern by the photomask. CONSTITUTION:In case of forming a photoresist pattern 3 having rectangular windows 2a, 3a, a reference graphic 12 of a simplar pattern is drawn at first, and then fine additional graphics 13a1-13a4 are drawn on four corners of the graphic 12. Then, a photomask having the shape of an exposure part 14a is formed on the basis of the reference graphic 12. A positive type photoresist layer 3' applied to a worked body 2 on a semiconductor substrate 1 is exposed. At that time, the lack of exposure on the four corner of the exposure pattern is corrected by fine patterns 15a1-15a4 to form an objective rectangular pattern (a). When the pattern (a) is developed, a photoresist pattern 3 having accurate rectangular windows 2a, 3a can be obtained. |
