| 摘要 |
PURPOSE:To enable a highly accurate pattern to be formed at high speed even in the vicinity of a heat generating element array, by sequentially providing a conductive thin film and a thin film capable of being changed in properties by high energy beams at a part for providing a circuit pattern, and simultaneously irradiating with a plurality of high energy beams arranged substantially on the same line at the same pitch as that of the circuit pattern to be provided. CONSTITUTION:A glass mask 16 is provided with spot form windows 17 having a width equal to that of discrete leads in the vicinity of a heat generating element array of a thermal head 13 to be manufactured, at the same pitch with that of the leads and substantially on a straight line. An aluminum substrate 18 is provided thereon with a film of a metal or the like, which is coated with a photosensitive chemical. The mask 16 is so disposed that the row of the windows 17 is parallel to an edge part of the substrate 18, and exposure of the coated film of the photosensitive chemical is performed by rotating the substrate 18 while irradiating with UV rays 19 made to be parallel by use of an optical system on the back side of the mask 16, thereby simultaneously forming latent image patterns of the discrete leads on a curved surface of the substrate 18 at positions at which a circuit pattern is to be provided, followed by development, fixation and etching. |
