发明名称 |
MESFETS AND METHODS OF MANUFACTURING MESFETS |
摘要 |
A compound semiconductor MESFET is provided with a passivation layer (54) which is crystallographically similar to a compound semiconductor active layer (53) thereunder and has at least one constituent that is a constituent also of the compound semiconductor of the active layer. The passivation layer is an insulating or semi-insulating layer, and has a forbidden band gap wider than that of the compound semiconductor of the active layer. Such a MESFET can have excellent RF and other characteristics. |
申请公布号 |
DE3471830(D1) |
申请公布日期 |
1988.07.07 |
申请号 |
DE19843471830 |
申请日期 |
1984.03.28 |
申请人 |
FUJITSU LIMITED |
发明人 |
TAKEUCHI, YUKIHIRO;HIRACHI, YASUTAKE;TAKIKAWA, MASAHIKO;KASAI, KAZUMI;OZEKI, MASASHI |
分类号 |
H01L21/338;H01L21/314;H01L23/29;H01L23/31;H01L29/78;H01L29/80;H01L29/812;(IPC1-7):H01L23/28;H01L29/201 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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