发明名称 MESFETS AND METHODS OF MANUFACTURING MESFETS
摘要 A compound semiconductor MESFET is provided with a passivation layer (54) which is crystallographically similar to a compound semiconductor active layer (53) thereunder and has at least one constituent that is a constituent also of the compound semiconductor of the active layer. The passivation layer is an insulating or semi-insulating layer, and has a forbidden band gap wider than that of the compound semiconductor of the active layer. Such a MESFET can have excellent RF and other characteristics.
申请公布号 DE3471830(D1) 申请公布日期 1988.07.07
申请号 DE19843471830 申请日期 1984.03.28
申请人 FUJITSU LIMITED 发明人 TAKEUCHI, YUKIHIRO;HIRACHI, YASUTAKE;TAKIKAWA, MASAHIKO;KASAI, KAZUMI;OZEKI, MASASHI
分类号 H01L21/338;H01L21/314;H01L23/29;H01L23/31;H01L29/78;H01L29/80;H01L29/812;(IPC1-7):H01L23/28;H01L29/201 主分类号 H01L21/338
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