发明名称 DRY ETCHING SYSTEM
摘要 PURPOSE:To easily perform the gas flow measurement by providing a dedicated connecting port for connection of a gas flow meter between a reaction chamber and a gas supply system pipeline and providing switching valves at the connecting port. CONSTITUTION:Between a reaction chamber 1 and a gas supply system pipeline, a dedicated connecting port 11 for connection of a gas flow meter is provided, and the connecting port 11 is provided with switching valves 2, 3. If the gas flow rate is to be checked, the valves after and before only a mass flow controller M.F.C 5, 6, 7 desired to be checked and one of reaction gas cylinders 8, 9, 10 corresponding thereto are made opened, and the valves after and before the other M.F.Cs 5, 6, 7 are closed. The valve 2 is closed, and the valve 3 is opened through the connecting port 11. With this, the flow rate of the M.F.C 5, 6, 7 desired to be checked is measured by means of a flow meter 4. Accordingly, the gas flow rate measurement is easily performed.
申请公布号 JPS63164432(A) 申请公布日期 1988.07.07
申请号 JP19860312226 申请日期 1986.12.26
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TANAKA YASUO;TOMITA KAZUYUKI;TANNO MASUO
分类号 H01L21/302;C23F4/00;H01L21/3065 主分类号 H01L21/302
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