| 摘要 |
PURPOSE:To enhance an aligning accuracy and a miniaturization and to manufacture in a mass production by so controlling the positions of a reticle fine movement base and a contraction lens, and a Z stage so that an optimum contraction ratio to a pattern aligning is set on the basis of an elongation or contraction value detection amount of a wafer or atmospheric pressure and temperature to print it. CONSTITUTION:An atmospheric pressure detector 3b and a temperature detector 3c are provided in a reduction stepper. having a Z stage 5c, a Z stage controller 5d, an X-Y stage 5a, an X-Y stage controller 5b, a reduction lens 4, a reticle fine movement base 2a, a stepwise driving error detector 7 and a pattern detector 3a. The positions of the base 2a and the lens 4 and the stage 5c are so controlled that an optimum reduction ratio to a pattern aligning is set on the basis of the elongation or contraction value detection amount-epsilon of a wafer 6 detected by the detector 7 or 3a or atmospheric pressure P and temperature T detected by the detectors 3b and 3c to print the pattern on a reticle 2b with a high aligning accuracy to the pattern on the wafer 6.
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