发明名称 HARD AMORPHOUS CARBON FILM
摘要 PURPOSE:To obtain a hard amorphous carbon film having high hardness, superior adhesion, wear resistance and lubricity, by incorporating Si and W into an amorphous carbon film contg. H. CONSTITUTION:Si and W are incorporated into an amorphous carbon film contg. H to obtain a hard amorphous carbon film contg., by atom, 10-35% H, 100ppm-0.1% Si and 50-500ppm W, having very high hardness and suitable for the surface protection of a magnetic disk. The hard amorphous carbon film is formed in a vacuum vessel 1 evacuated to a prescribed pressure by a rotary pump 9. Electrodes 2, 6 are placed opposite to each other in the vessel 1, a screen mesh electrode 3 made of W is placed between the electrodes 2, 6 and a prescribed DC voltage is impressed. A gaseous mixture consisting of gaseous CH4 10, gaseous H2 11 and gaseous SiH4/H2 12 in a prescribed ratio is introduced into the vessel 1 from the inlet 4, glow discharge is caused and the hard amorphous carbon film is formed on the surface of a substrate 5 set on the electrode 6.
申请公布号 JPS63162872(A) 申请公布日期 1988.07.06
申请号 JP19860310325 申请日期 1986.12.25
申请人 NEC CORP 发明人 SHOHATA NOBUAKI;FUJII KAZUTAKA
分类号 C23C16/26;C10M103/00;C10M103/02;C10M103/04;C10N10/12;C10N40/18;C23C16/30;C23C16/50;G11B5/187;G11B5/72 主分类号 C23C16/26
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