| 摘要 |
PURPOSE:To form a thin film having superior symmetry properties in contact holes, by disposing inner and outer annular electromagnets to the rear of a target and by forming so that the diameter of a yoke in the intermediate part between the above electromagnets is regulated to about one-half that of a yoke in the outside peripheral part or less. CONSTITUTION:A substrate 1 and a target 3 are oppositely disposed in a vacuum chamber 2, and a double-pole electromagnet 4 is disposed to the rear of the target 3. The inside of the vacuum chamber 2 is evacuated and Ar gas, etc., are introduced into the chamber, and negative potential is applied to the target 3 so as to produce plasma discharge in front of the target 3. At the same time, the above electromagnet is electrified and plasma is concentrated in a region of high magnetic flux density so as to sputter the target 3 and form a thin film on the substrate 1 surface. The above electromagnet 4 is constituted of inner and outer electromagnets 5, 6 and columnar and annular yokes 9, 10, and 11. Further, the above electromagnet 4 is formed so that thickness 7 of the inner electromagnet 5 is smaller than the thickness 8 of the outer electromagnet 6 and the diameter of the yoke 10 in the intermediate part is one-half that of the yoke 11 in the outside peripheral part or less. In this way, plasma region is widely changed, so that thin film can be formed in the contact holes in the substrate 1 with superior symmetry properties.
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