AMORPHOUS PHOTOVOLTAIC DEVICE

摘要

PURPOSE:To avoid warpage by providing an amorphous material film with a tensile stress between a substrate and a metal electrode film. CONSTITUTION:An amorphous material film 6 is provided between a substrate 5 and a metal electrode film 7. An amorphous silicon film is deposited by a glow discharge decomposition method on the substrate 5 with a thickness of 1mum as the amorphous material film 6. The conditions of forming the film are such that SiH4: 50 SCCM, a pressure: 100 Pa. a RF power: 50 W and a substrate temperature: 100 deg.C. In an amorphous photovoltaic device constituted like this, the two types of stresses are cancelled with each other on the substrate so that the warpage of the substrate can be avoided.