X-RAY DISPERSIVE AND REFLECTIVE STRUCTURES AND METHOD OF MAKING THE STRUCTURES
摘要
<p>X-ray dispersive and reflective structures and materials are provided which exhibit at least one third of the theoretical integral reflection coefficient for the structures in the range of interest without fluorescence or absorption edges. The materials can be thermally activated to control the desired properties, during or post deposition. The structures can be deposited by ion beam absorption techniques to form the structures in a precise manner. The index of the refraction of the structures can be continuously varying throughout the structures.</p>
申请公布号
CA1238988(A)
申请公布日期
1988.07.05
申请号
CA19840455354
申请日期
1984.05.29
申请人
OVONIC SYNTHETIC MATERIALS COMPANY , INC.
发明人
KEEM, JOHN E.;OVSHINSKY, STANFORD R.;FLESSA, STEVEN A.;WOOD, JAMES L.;HART, KEITH L.;SZTABA, LENNARD