| 摘要 |
PURPOSE:To obtain a mask pattern data of a new design standard in a short time, in case a design standard has been changed, b y generating automatically a symbolic data of a mask pattern from an existing mask pattern data, and generating a mask pattern data of a new design standard. CONSTITUTION:A device of a transistor, a resistance, etc. is extracted from an existing mask pattern data contained in a magnetic disk device 8, by referring to a device definition file, and a symbolic data a symbolic data is generated automatically by referring to a design standard file, and using a symbolic converter 7, and contained in a magnetic disk device 6. By using a compaction function by a central processing unit 1, and referring to the design standard file, the symbolic data is reduced so that length in the vertical and horizontal directions becomes minimum. After the expected symbolic data has been obtained, a mask pattern is generated automatically by referring to the design standard file. In such a way, even if the design standard is charged, an expected mask pattern can be obtained in a short time.
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