| 摘要 |
PURPOSE:To improve the sensitivity, the resolution and the stability of a resist material by using a specific fluorine contg. itaconic acid ester polymer as the resist material. CONSTITUTION:The fluorine contg. itaconic acid ester shown by formula I is used as the resist material. In the formula, A is a structural unit derivated from a monomer having a double bond capable of copolymerizing, R1 is 1-5 C a fluorine substd. alkyl group, R2 is hydrogen atom or a fluorine substd. alkyl group same as that of R1 group, (m) is a positive integer, (n) is 0 or a positive integer, (n/m) is 0-99. Thus, the decomposition reaction of the main chain of the polymer contd. in the resist material is liable to occur by irradiating an electron beam or a X ray, and the solubility of the radiated part is remarkably improved than that of the unradiated part. As said polymer contains >=2 carbonyl groups in the molecule of the polymer, and contains the fluorine atom, the decomposition reaction of the polymer easily occur, thereby increasing the sensitivity of the resist material. |
