| 摘要 |
PURPOSE:To improve the pattern accuracy of a duplicating matrix by bringing a photoresist film to vacuum low temperature drying before forming a metal thin film. CONSTITUTION:A photoresist is brought to spin coating on the substrate of glass, etc., a photoresist film 2 is formed, exposed in a pattern shape by using a hologram, thereafter, developed, and a pattern 3 is formed on the film 2. Subsequently, it is brought to infrared heating and vacuum low temperature heating in a vacuum container. Next, the metal thin film 4 of nickel, etc., is vapor-deposited, and by using it as one electrode, nickel plating is executed, and a nickel film 5 is formed. Subsequently, the film 2 is dissolved by an organic solvent, and a duplicating matrix consisting of the film 5 is obtained. |
