| 摘要 |
PURPOSE:To provide a titled apparatus for production which prevents abnormal discharge by limiting the discharge direction with a grounding plate and prevents sticking of a raw material to be evaporated to an electrode part at the time of vapor deposition of a photosensitive layer by covering the counter substrate side of the electrode for ion bombardment to clean the substrate for the electrophotographic sensitive body with the grounding plate and providing a heating source behind said plate. CONSTITUTION:The inside of a vacuum deposition vessel 1 is maintained under 0.1-1Torr vacuum degree and +500V DC voltage is impressed to the electrode 5 for on bombardment to generate the stable glow discharge between the substrate 3 and a high voltage part 6. The generation of the abnormal discharge such as arc discharge to the grounding plate 8 is thereby obviated. The electrode 5 is heated by a heater 9 to increase the temp. in the plate 8 part up to, for example, 350 deg.C and to maintain said temp. at the time of executing the vacuum deposition after execution of the ion bombardment to the substrate 3 by the glow discharge. As a result the sticking of a raw material to be deposited by evaporation to the high voltage part 6 of the electrode is obviated and the repetitive use of the electrode 5 is permitted. |
