| 摘要 |
PURPOSE:To improve the sensitivity and the resolution of a photoresist and the durability of dry-etching thereof by using the titled composition contg. a specific siloxane polymer, an aromatic azide compd. and a sensitizer. CONSTITUTION:The negative type composition contains the siloxane polymer shown by formula I, the aromatic azido compd. shown by formula III and the sensitizer such as a benzoin compd. And, the siloxane polymer shown by formula II may be used instead of the polymer shown by formula I wherein X is R'''-CO- group or a carboxyl group, etc., R-R'' is H atom or alkyl group, etc., R''' is a (substd.)hydrocarbon group, (l), (m) and (n) are 0 or a positive integer. The positive type composition is obtd. by combining the polymer shown by formula I or II and a prescribed diazonaphthoquinone compd. The photoresist having the excellent sensitivity and resolution and the excellent durability of the dry-etching is obtd. by using the titled composition. |
