| 摘要 |
PURPOSE:To make it possible to utilize again recovered resist, by recovering the scattered resist in a specified period from the time when a plate starts to rotate. CONSTITUTION:Resist is dripped on the center of a plate 3. Then a recovering inlet shutter 13 is moved upward, and recovery inlet 10 for resist to be reproduced is opened. A plate 3 is made to start a high speed rotation, and the resist 5 is scattered all over the plate surface. After several seconds, for example, from the time when the plate starts the rotation, the recovery inlet 10 is shut by moving a shutter 13 downward with a cylinder 14. Thereby, the resist of large particle 5 can be recovered and accumulated in a recovery vessel 11, during several seconds from when the plate 3 starts the rotation. After that, the resist of small particle 5 is not recovered, but collected in a throwaway resist vessel 6, which is scrapped.
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