发明名称 MAGNETRON SPUTTERING APPARATUS
摘要 PURPOSE:To make the erosion of a target uniform, by providing a means of changing a leakage magnetic field to a sputtering apparatus having the target on inside and outside magnetic poles having opposite polarities so as to form a prescribed magnetic filed distribution. CONSTITUTION:An inside magnetic pole 2 is enclosed with an outside magnetic pole 3 whose polarity is opposite to that of the pole 2 and a target 1 is placed on the poles 2, 3. A magnet 5 is set in a magnetic field formed on the rear side of the target 1 between the poles 2, 3. A leakage magnetic field from the poles 2, 3 is changed by the magnet 5 so as to reduce the gradient of a component of the magnetic field perpendicular to the target 1 at the central part between the poles 2, 3 on the outside of the target 1 and to increase the gradient at parts close to the poles 2, 3.
申请公布号 JPS63157866(A) 申请公布日期 1988.06.30
申请号 JP19870034543 申请日期 1987.02.19
申请人 MITSUBISHI KASEI CORP 发明人 ARITA YOJI
分类号 C23C14/36;C23C14/35;C23C14/54 主分类号 C23C14/36
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