发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 PURPOSE:To improve the photosensitivity of a titled compsn. by incorporating a compd. having specific orthonitrocarbinol ether groups into the compsn. CONSTITUTION:The compd. having >=1 orthonitrocarbinol ether groups which can be decomposed by projection of active rays, i.e., the compd. expressed by the formula is used in the compsn. In the formula, A denotes a nonmetallic atom group which forms an arom. ring or heterocycle with -C-C(-NO2)-; X denotes H, alkyl of 1-8C. This compd. is usable alone or in combination of >=2 kinds. A high mol.wt. binder (e.g.: novolak resin) which is insoluble in water and is soluble in an aq. alkaline soln. is preferably added to the compsn. A compd. which generates an acid by exposing and dye and lipophilic resins, etc., which bond to the acid may be added thereto at need.
申请公布号 JPS63157147(A) 申请公布日期 1988.06.30
申请号 JP19860304974 申请日期 1986.12.19
申请人 KONICA CORP;MITSUBISHI KASEI CORP 发明人 MATSUBARA SHINICHI;NAKAI HIDEYUKI;URANO TOSHIYOSHI;MURAKAMI SACHIKO
分类号 G03C1/00;G03C1/72;G03F7/004 主分类号 G03C1/00
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