发明名称 METHOD FOR GROWING ZINC SELENIDE SINGLE CRYSTAL FILM
摘要 PURPOSE:To improve the electrical, optical, and crystallographic characteristics, by growing ZnSe on a GaAs substrate at a specified temp. to moderate the lattice irregularity, and then further low temp. growing the crystal thereon. CONSTITUTION:ZnSe is grown on GaAs at 320-550 deg.C by an organometallic vapor growth method to obtain a first layer. An org. Zn compd. and the hydride of Se or an org. Se compd. are used in the organometallic vapor growth method. A second layer is further grown at the low temps. of 230-270 deg.C.
申请公布号 JPS63156096(A) 申请公布日期 1988.06.29
申请号 JP19860302036 申请日期 1986.12.18
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 OGAWA HARUKI;KAWABATA TOSHIHARU;FURUIKE SUSUMU
分类号 C30B25/02;C30B29/48;H01L21/365 主分类号 C30B25/02
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