| 摘要 |
PURPOSE:To decrease an amount of resist to be used and enable a uniformly thin resist film to be formed at low cost, by rotating a substrate while supplying the resist to the substrate through an aperture and then rotating the substrate so as to form a thin photosensitive resist film on the substrate. CONSTITUTION:A substrate 13 is rotated within the atmosphere of resist while resist is supplied to the substrate through an aperture 11 of a resist supply means 12. After that, a thin photosensitive resist film is formed on the substrate 13 by rotating the substrate. The amount of resist to be used can be decreased by applying it on the substrate by the use of boundary surface tension between the resist and the substrate and own weight of the resist.
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