发明名称 METHOD OF FORMING A NITRIDE LAYER
摘要 <p>9444-18 A method of forming a layer of a nitride or carbonitride of titanium, vanadium or the like on the surface of an article to be treated includes disposing a treating material composed of refractory powder, powder of a metal or alloy of a nitride forming element and a halide powder, and the article to be treated in a fluidized bed furnace, ancl introducing a nitrogen-containing gas into the furnace under heated conditions to fluidize the treating material, thereby effecting the surface treatment. This method provides a nitride or carbonitride layer having a smooth surface and a uniform thickness rapidly and safely without using hydrogen and a halogen vapor. The method is much safer than that of prior art. TC6011-2</p>
申请公布号 CA1238558(A) 申请公布日期 1988.06.28
申请号 CA19850482532 申请日期 1985.05.28
申请人 KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO 发明人 ARAI, TOHRU;ENDO, JUNJI
分类号 C23C12/02;C01B21/06;C01B21/082;C23C16/34;C23C16/36;C23C16/442;C23C16/448;F27B15/00;(IPC1-7):C23C16/34 主分类号 C23C12/02
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