发明名称 ELECTRON CYCLOTRON RESONANCE PLASMA EQUIPMENT
摘要 PURPOSE:To grow a film of good quality uniformly by forming uniform distribution of a temperature on a susceptor by locally heating the susceptor in an equipment by a high frequency coil provided only near the position where the susceptor is located. CONSTITUTION:A magnetic field is generated in a quartz tube 12 and plasma 13 is generated by introducing a microwave 10. In this case, a carbon susceptor 16 for mounting a sample 17 which is provided in the quartz tube 12 is heated by using only a high frequency coil 19 provided near the susceptor 16 outside of the quartz tube 12. The coil 19 generates high frequency 8-10 kHz by setting the number of wirings appropriately with power of 4-10 kw and heats the susceptor 16 nearly uniformly within the range of a temperature 500-1000 deg.C. This enables obtaining the uniform distribution of the temperature above the susceptor 16 and uniformly growing a good quality film.
申请公布号 JPS63155609(A) 申请公布日期 1988.06.28
申请号 JP19860301165 申请日期 1986.12.19
申请人 FUJITSU LTD 发明人 MOTOYAMA TAKUYUKI
分类号 H01L21/31;H01L21/205;H05H1/18 主分类号 H01L21/31
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