| 摘要 |
PURPOSE:To shorten the waiting time in a reaction chamber and to improve productivity by taking the next substrate into a substrate exchanging chamber during the treatment of a substrate in the CVD reaction chamber and completing vacuum evacuation before the end of said treatment. CONSTITUTION:A substrate 47, 47' support 24 is provided in the substrate 47, 47' exchanging chamber 5 in which a vacuum state is maintained by closing gate valves 10, 11 in both side wall parts and opening a gate valve 6 with a relay vacuum chamber 3. The untreated substrate 47 is held imposed in an upper supporting part 58 thereof. The treated substrate 47' is then imposed in the vacuum state to the lower supporting part 59 of the support 24 by the combination of the forward and backward motion of a fork 8 in the above-mentioned chamber 3 and the vertical motion of a driving shaft 24 which moves the support 24 vertically in such a manner that the said support can be stopped in prescribed plural positions. The substrate 47 is ejected in this state through the above-mentioned chamber 3 to 1st and 2nd reaction vacuum chambers 2a, 2b; thereafter, the inside of the chamber 5 is restored to the atm. pressure and the substrate 47' is ejected to a cassette 15 by a belt 14, etc. The substrate 47 in a cassette 13 is carried by a belt 12, etc., into the above-mentioned supporting part 58. The inside of the chamber 5 is evacuated and the above-mentioned operations are repeated. |
