| 摘要 |
PURPOSE:To take advantage of respective individual films and to obtain an excellent electrochromic element by forming a 1st electrode into two-layered structure consisting in forming an ITO film on a substrate and further laminating an SnO2 film thereon. CONSTITUTION:The 1st electrode layer 2 is made into the two-layered constitution consisting of the SnO2 film 2b and ITO (indium oxide In2O3 contg. about 1-10%, more preferably about 5% SnO2 therein) film 2a. For example, the electrode formed by laminating the SnO2 film 2b to 200Angstrom onto the ITO film 2a of 800Angstrom is used as the transparent electrode 2 on the glass substrate 1 and the IrOx film having 300Angstrom thickness is formed by a reactive sputtering method introducing oxygen and hydrogen as a reactive gas thereon. Further, a Ta2O5 film 4 is formed as an insulating layer to 3,000Angstrom , WO3 is formed as a cathode side color forming layer 5 to 4,000Angstrom thereon and a semitransparent gold film is formed as a 2nd electrode 6 thereon successively by vapor deposition of an electron beam method to prepare a fully solid state electrochromic element. The electrochromic element having the good responsiveness in coloration and decoloration of the electrochromic layer is thereby obtd.
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