| 摘要 |
<p>Process for the treatment of articles such as silicon wafers, and a container for implementing this process. Inside a room of intermediate cleanliness, the wafers 24 are kept inside a container 72 in which the atmosphere is of very high cleanness by virtue of a fan 84 which circulates air through an absolute filter 100. This container 72 can be used for transferring the wafers 24 by virtue of a nozzle 104 which can enter the nozzle 105 of larger section of another container 74 of the same type, placed on a machine 76. A rod 110 makes it possible to transfer the basket of wafers 14 from the first container 72 to the lift 80 of the machine 76. Application to the microelectronics industry. <IMAGE></p> |
