发明名称 METHOD AND APPARATUS FOR MEASURING SPECIMEN PROCESSING STATE
摘要 PURPOSE:To measure a specimen processing state with high accuracy, by calculating the peak position of a bright line spectrum having a known wavelength and operating the real wavelength at the time of scanning from said position to perform calibration. CONSTITUTION:Only a predetermined wavelength component is taken out from the light of a light source 1 by a spectral path 2 having wavelength scanning function and the spectrally diffracted light thereof is incident to a specimen 3. Interference light is generated according to the processing state of the specimen 3 by said incidence and inputted to a photoelectric converter 5 by a half mirror 4 to be converted to an electric signal. This electric signal is outputted from the converter 5 and amplified by an amplifier 6 to be inputted to a signal processor 7. When the peak position of the bright line spectrum in the waveform of the interference light is measured, the optical output of a spectroscope 2 is inputted to the converter 5 before incident to the specimen 3 and, when the peak position is calculated on the basis of luminous intensity thereof, the shift of the peak position can be reduced. By this method, a specimen processing state can be measured with high accuracy.
申请公布号 JPS63149542(A) 申请公布日期 1988.06.22
申请号 JP19860294838 申请日期 1986.12.12
申请人 HITACHI LTD 发明人 KAJI TETSUNORI;MOROI TATSUO;OOHIRAHARA YUUZOU
分类号 H01L21/66;G01N21/47 主分类号 H01L21/66
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