发明名称 VAPOR DEPOSITION DEVICE
摘要 PURPOSE:To miniaturize a vacuum vessel and to efficiently keep the vacuum by specifying a mechanism for moving an object in the lengthwise direction and rotating the object in the title device for vacuum-depositing a film on the long-sized object. CONSTITUTION:A rotation source 2 on the outside of the vacuum vessel 1 and a rotating shaft 5 in the vacuum vessel 1 are connected through a transmitting shaft 3 airtightly piercing through the vacuum vessel 1. A supporting shaft 11 is set in the vacuum vessel 1 in parallel with the rotating shaft 5, and made freely movable in the axial direction and rotatable through a slide pulley 12 and a slide rod 13. The supporting shaft 11 is arranged in a vapor phase region A, and the object H is supported on its outer periphery. The rotating shaft 5 and the rod 13 are connected by a conversion mechanism 14 having a female screw part 15, and the supporting shaft 11 is moved in the axial direction with respect to the region A. The rotating shaft 5 and the pulley 12 are connected by a transmission mechanism 17, and the supporting shaft 11 is rotated in the direction of vapor deposition in the region A. By this method, the shaft piercing through the vacuum vessel 1 is limited to the transmitting shaft 3, and high vacuum can be advantageously maintained.
申请公布号 JPS63149370(A) 申请公布日期 1988.06.22
申请号 JP19860294455 申请日期 1986.12.10
申请人 TOSHIBA CORP 发明人 YOSHIDA TOMIO
分类号 C23C14/24 主分类号 C23C14/24
代理机构 代理人
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