发明名称 METHOD AND EQUIPMENT FOR MICROWAVE PLASMA TREATMENT IN MAGNETIC FIELD
摘要 PURPOSE:To widen practically applicable magnetic field conditions and expand process characteristics by a method wherein the magnetic field conditions which are effective for starting a discharge and the magnetic field conditions which are effective in the aspect of the process characteristics are independently controlled step by step. CONSTITUTION:A sample 20 is placed and treating gas is introduced into a discharge tube 12 and a pressure in the discharge tube 12 is controlled to be a required value. On the other hand, signals corresponding to conditions of a current applied from an electric source 16 to a field coil 15 which are determined by a magnetic field intensity which produces a discharge in the discharge tube 12 easily and which are inputted to a control means 17 are inputted to the electric source 16 from the control means 17 and the conditions of the current applied from the electric source 16 to the field coil 15 are properly controlled to produce the discharge in the discharge tube 12 easily. After the discharge is produced as described above, the magnetic field intensity is controlled to the intensity corresponding to the treatment of the sample 20. With this constitution, the practically applicable magnetic field conditions can be widened and the process characteristics can be expanded.
申请公布号 JPS63148635(A) 申请公布日期 1988.06.21
申请号 JP19860294839 申请日期 1986.12.12
申请人 HITACHI LTD 发明人 HAMAZAKI RYOJI;FUJII TAKASHI
分类号 H01L21/302;C23F4/00;H01L21/205;H01L21/3065;H01L21/31 主分类号 H01L21/302
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