| 摘要 |
PURPOSE:To simplify a treatment process by carrying out a diffusion treatment of a silicon substrate, thereby using a heating system with lamps having filters or a shielding plate in a furnace casing and also by causing the sheet resistance to have partially in-plane variations with only a diffusion process. CONSTITUTION:A heating system with lamps having filters 6a and 6b or a shielding plate in a furnace casing 1 is used and a diffusion treatment of a silicon substrate 5 is carried out by arranging the silicon substrate 5 in the furnace casing 1 of the heating system with lamps and then, its treatment permits the sheet resistance to have in-plane variations partially. Accordingly, an junction structure where a place that is under an electrode forms a low sheet resistance part 12 and a receiving light plane part forms a high sheet resistance part 13 is formed by performing only a diffusion process. In this way, a manufacturing process of a solar cell is simplified and also the element efficiency is improved. |
