| 摘要 |
PURPOSE:To obtain gaseous GeF4 with high purity by passing gaseous GeF4 contg. CO2 impurity at least through a zeolite layer, which is previously heated and subjected to a dehydrating treatment, at a specific temp. CONSTITUTION:The zeolite layer is subjected to dehydrating treatment by heating at 200-600 deg.C and the hydrated zeolite layer is kept at -37 deg.C- ordinary temp. Then the gaseous GeF4 contg. CO2 as impurity at least is passed through the zeolite layer. Thus the gaseous GeF4 with high purity is easily obtained by using the inexpensive zeolite.
|
