| 摘要 |
PURPOSE:To obtain the titled composition composed of a polysilane or a polysiloxane type polymer capable of forming a fine resist pattern by incorporating a specific polymer to the titled composition, thereby dissolving fully said composition in an alkaline solution, after photodecomposition by exposing it. CONSTITUTION:The titled composition is composed of the polymer having a structural unit shown by formula I or II wherein R1-R4 and R14-R17 may be the same or different with each other, and are each hydrogen atom, 1-10C an aliphatic group, 6-14C an unsubstd. or a substd. aromatic group, R5-R8 may be the same or different with each other and are each hydrogen atom, hydroxyl, alkoxy, 1-10C an aliphatic, 6-14C an unsatd. or a satd. aromatic group, R9-R13 may be the same or different with each other, and are each hydrogen or halogen atom, 1-12C alkyl group, 1-12C alkoxy group, cyano, nitro or hydroxy group, (m) is a positive integer, (n) is a positive integer, including zero. Thus, the component soluble to an alkaline solution is formed by decomposing the irradiated part of the titled composition by irradiating an energy ray such as a UV ray, a visible ray, an electron beam or a X ray, etc. |
