| 摘要 |
In a gas distribution arrangement the processing gas is admitted from a helical inlet duct through an annular orificial slit into a space between two coaxial guide walls. Guide vanes are provided in the orificial slit to impart a change of direction to the flow of processing gas. Each guide vane is a spatial body with differently extending, vertical limitation surfaces, which between adjacent vanes delimit ducts whose sectional area as measured transversely of the flow direction of the processing gas through the individual duct is substantially of the same size over the extent of the duct. The vertical height of the guide vanes may decrease along their radial extent inwards in the orificial slit, and their vertical limitation surfaces may form an acute angle at the radially innermost ends of the guide vanes. |
