| 摘要 |
PURPOSE:To accurately and easily form a light shielding film by employing a lift-off method by utilizing a photoresist mask when a transparent conductive film is patterned. CONSTITUTION:A photoresist film 10 is laminated on a transparent film 9 and exposed through the photomask 11, and development and etching are carried out to form a pattern. A layer 12 made of a material which can be dyed is formed over the entire surface and the resist is dissolved to remove it by the lift-off method, so that the layer made of the material which can be dyed is left only in the gap on the transparent conductive film. This layer is dyed with pigment by being dipped in a dye solution or by another method like this to form the light shielding film 12'. Then, color filters 13, 14', and 13'' which differ in color tone are formed in order on the transparent conductive film. |
