| 摘要 |
PURPOSE:To grow a sample in a multilayer by monitoring the intensity of a diffracted X-ray in a boundary superstructure when a depositing substance is deposited on the sample, thereby preventing the sample from damaging. CONSTITUTION:A sample 1 is attached to a sample stand 2 of a rotating mechanism 3 of a goniometer to set the sample 1 at a predetermined position, a shutter 10 is opened to discharge a depositing substance from a deposition source 5 toward the sample 1 of the stand 2, thereby depositing the substance 4 on the sample 1. In this case, strong X-ray 11 such as synchrotron radiation X-ray from the window 7a of an ultrahigh vacuum tank 8 is irradiated to the sample 1. The X-ray 11 radiated to the sample 1 is diffracted by a boundary superstructure of the sample 1, and irradiated as diffracted X-ray 12 from the beryllium window 7b of the tank 8. One to multiple layers are laminated while evaluating with the X-ray the superstructure having a larger period than a bulk crystal and present on several atom layers near the boundary while observing it on-site by monitoring the intensity of the X-ray 12.
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