发明名称 METHOD AND DEVICE FOR FORMING LONG-SIZED FILM
摘要 PURPOSE:To efficiently form a uniform long-sized film by moving an evaporation source along a long-sized work, subjecting the work to vapor deposition of an evaporating material, detecting the thickness distribution of the formed film and executing the next film formation while controlling the moving speed of the evaporation source. CONSTITUTION:The evaporation source 11 which evaporates a film material P packed in a crucible 12 by an electron gun (not shown in figure) in a vacuum chamber 10 is moved along the work W by a moving mechanism 14. the work W is thereby subjected to the vapor deposition of the evaporating material, by which the film is formed thereon. The film thickness distribution in the longitudinal direction of the work W is then detected by plural film thickness sensors 21 consisting of sensor parts 21a and monitor parts 21b. The next film formation is executed while the moving speed of the evaporation source 11 is controlled via a driving device 16 and the moving mechanism 14 by a data processor 22 in accordance with the results of the detection obtd. in such a manner. The film formation on the long-sized material is thereby uniformly, easily and efficiently executed with the low-cost device.
申请公布号 JPS63143262(A) 申请公布日期 1988.06.15
申请号 JP19860289899 申请日期 1986.12.05
申请人 ISHIKAWAJIMA HARIMA HEAVY IND CO LTD 发明人 NAKAJIMA SHINOBU
分类号 C23C14/54;C23C14/56 主分类号 C23C14/54
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