Novel electron beam resist materials

摘要

Positive acting electron beam resist materials are described. The material comprises a polymer having fundamental units of the general formula <IMAGE> in which R1, R2 and R3 independently represent hydrogen or a hydrocarbon group having from 1 to 6 carbon atoms, and R4 represents an organic residue having from 1 to 20 carbon atoms. The polymer may be used, as the resist material, as it is or by mixing with other type of resin.