| 摘要 |
PURPOSE:To obtain a guide with a very high dimension accuracy by providing a plasma polymerization resist film having a photosensitivity by a plasma polymerization method on a substrate, forming the pattern of a guide shape to this and executing next a plasma etching. CONSTITUTION:With parallel plate electrodes 3 and 4 provided in a reaction tank 2, discharging is executed, a plasma polymerization film 8 is formed on the front surface of a substrate 1 and a substrate layer is obtained. Next, a monomer for forming a guide is introduced, the inside of the reaction tank 2 is kept in balance, the discharging is executed by the parallel plate electrodes 3 and 4 and on the substrate layer, a plasma polymerization resist film 9 of several mu is made. With an electronic beam and an X-ray, the pattern drawing of a guide shape is executed to the plasma polymerization resist film 9. With the low gas pressure, the plasma etching is executed, and the thing adhering to the film of the guide shape can be obtained by a developing processing. Thus, a working process can be shortened, the dirt preventing effect by a continuous film forming can be increased and the durability and accuracy of the optical recording medium can be improved.
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