DEVICE FOR FORMING MULTI-LAYERED FILM BY LASER CVD

摘要

PURPOSE:To form extremely thin multi-layered films having a high grade and large area on a substrate by providing reaction chambers where gaseous materials are subjected to photolytic reaction by laser beams to form film on the substrate and moving the substrate to the respective reaction chambers, thereby forming the film successively thereon. CONSTITUTION:The gaseous reaction material A is introduced by a prescribed pressure into the reaction chamber 1 and while a purging gas 4 is blown to an incident window 9, laser light from a laser 15 is linearly condensed via a cylindrical lens 5 and a rotary mirror 6 onto the substrate 3, by which the desired area on the substrate 3 is scanned. The substrate 3 is moved to a film thickness monitor chamber 13 when the material A is so coated on the substrate 3 as to attain a prescribed thickness. A monitor ray 7 is then projected to the substrate and the film thickness is evaluated by monitor photodetector 8. The substrate 3 is moved to the reaction chamber 2 when the film thickness is the prescribed thickness. The material B of the prescribed thickness is then coated on the substrate 3 by the similar operation as in the reaction chamber 1 and by using the gaseous reaction material B. The film thickness is measured in a film thickness monitoring chamber 13. The multi-layered films are formed in the above-mentioned manner, by which the extremely thin multi-layered films having the high quality and large area are obtd.