发明名称 ION IMPLANTATION EQUIPMENT
摘要 PURPOSE:To safely and easily discharge a retained gas caused by the clogging in a gas-feed, by providing a bypass line to a gas-feed line connecting a gas box and an ion source in an ion implantation equipment and also by connecting the output to an exhaust system. CONSTITUTION:A gas bypass line 9 leading to a main heat exhaust line 8 is connected to a gas-feed line 2 connecting a gas box 1 and an ion source 3 in an ion implantation equipment, and a stop valve 10 is attached to the midway. At ordinary time the stop valve 10 is closed, but, when troubles arise from some cause in the ion source 3 and a connection 2a of the gas-feed line and the gas-feed line 2 is clogged, the stop valve 10 of the gas bypass line 9 is opened and the gas retained between the gas box 1 and the ion source 3 can be released into the main heat exhaust line 8 safely and easily.
申请公布号 JPS63140080(A) 申请公布日期 1988.06.11
申请号 JP19860288208 申请日期 1986.12.03
申请人 MITSUBISHI ELECTRIC CORP 发明人 TAKAHASHI TAKETO
分类号 C23C14/48 主分类号 C23C14/48
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