发明名称 |
MANUFACTURE OF HETERO JUNCTION BIPOLAR TRANSISTOR |
摘要 |
PURPOSE:To facilitate processes markedly by a method wherein a fine collector as well as an emitter and an emitter electrode are formed in self alignment using the same mask. CONSTITUTION:A temporary emitter 13 is removed by etching process to expose a cap layer 6a of emitter forming a recession 15. First, an emitter electrode metal is formed by evaporation and lift off process. Second, hydrogen ion is implanted in a layer 3 using an emitter electrode 8 as a mask to form a collector while an outer region 3b below the emitter electrode 8 is semiinsulated to form a fine collector region 3a in substantially the sane size as that of emitter electrode 8. Through these procedures, the processes can be facilitated markedly to improve the yield thereof notably.
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申请公布号 |
JPS63138774(A) |
申请公布日期 |
1988.06.10 |
申请号 |
JP19860286324 |
申请日期 |
1986.12.01 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
INADA MASAKI;YANAGIHARA MANABU;OTA TOSHIMICHI;NAKAGAWA ATSUSHI |
分类号 |
H01L29/73;H01L21/331;H01L29/205;H01L29/72;H01L29/737 |
主分类号 |
H01L29/73 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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