发明名称 MANUFACTURE OF HETERO JUNCTION BIPOLAR TRANSISTOR
摘要 PURPOSE:To facilitate processes markedly by a method wherein a fine collector as well as an emitter and an emitter electrode are formed in self alignment using the same mask. CONSTITUTION:A temporary emitter 13 is removed by etching process to expose a cap layer 6a of emitter forming a recession 15. First, an emitter electrode metal is formed by evaporation and lift off process. Second, hydrogen ion is implanted in a layer 3 using an emitter electrode 8 as a mask to form a collector while an outer region 3b below the emitter electrode 8 is semiinsulated to form a fine collector region 3a in substantially the sane size as that of emitter electrode 8. Through these procedures, the processes can be facilitated markedly to improve the yield thereof notably.
申请公布号 JPS63138774(A) 申请公布日期 1988.06.10
申请号 JP19860286324 申请日期 1986.12.01
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 INADA MASAKI;YANAGIHARA MANABU;OTA TOSHIMICHI;NAKAGAWA ATSUSHI
分类号 H01L29/73;H01L21/331;H01L29/205;H01L29/72;H01L29/737 主分类号 H01L29/73
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