| 摘要 |
PURPOSE:To prevent the mixing of impurities between respective soln. reservoirs by providing an upper lid member provided with a reducing gas inlet passage on a soln. holder in the title device for liq. phase epitaxy by a slide boat method. CONSTITUTION:A substrate holder 2 is set on a base 1, and the soln. holder 3 provided with plural soln. reservoirs 5-8 is arranged on the substrate holder 2. The upper lid member 9 provided with the gas passage 10-13 for introducing a reducing gas into the soln. reservoirs 5-8 at the positions corresponding to the soln. reservoirs 5-8 is furnished on the soln. holder 3. The solns. for the growth 14-17 are respectively charged in the soln. reservoirs 5-8, the upper lid member 9 is placed thereon, and the assembly is arranged in a reaction tube. The reaction tube is held in a growth furnace, a reducing gas is sent into the respective soln. reservoirs 5-8 through the gas passages 10-13 of the upper lid member 9 to purify the solns. for the growth 14-17, then the substrate holder 2 is slid, and lid. phase epitaxy is carried out.
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