| 摘要 |
PURPOSE:To form a thin-film having high uniformity and high quality by connecting a transference electrode at one end of a plasma discharge electrode through a jig when the thin-film is shaped onto a substrate with a transparent conductive film through plasma discharge. CONSTITUTION:A plasma discharge device forming laminated films for a target such as a hole blocking layer 21, a photoconductive film 22, a beam blocking layer 23, etc., onto a face plate 2 as a substrate for the target to which a NESA film 7 is shaped consists of an electrode 3, which is mounted to a susceptor 1 section and has a pawl section 3a holding and fixing the plate 2, and an electrode 4 oppositely arranged to the electrode 3, and the whole device is brought to a vacuum state. When forming the conductive film 22, the mesa film 7 side of the plate 2 is directed toward the pawl section 3a side of the electrode 3, and fitted through a mask 5. A leaf spring 6 is interposed between the plate 2 and the susceptor 1, and the plate 2 is energized and fastened to the electrode 3 side. Accordingly, the electrode 3 and the mesa film 7 are conducted, plasma discharge can be conducted equally, and the conductive film having high uniformity can be shaped.
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