发明名称 |
Bipolar transistor |
摘要 |
A bipolar transistor in which a collector layer 35, a base layer 34 and an emitter layer 33 are transversely arranged in sequence through a monocrystal silicon layer formed on an insulation layer of a semiconductor substrate. The transistor may be fabricated by transverse diffusion in sequence from a hole in part of the silicon layer. The structure reduces parasitic capacity between base and collector, and removes p-n junction capacity between the collector and substrate to achieve high-speed operation.
<IMAGE>
|
申请公布号 |
GB2198285(A) |
申请公布日期 |
1988.06.08 |
申请号 |
GB19870025631 |
申请日期 |
1987.11.02 |
申请人 |
* MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
TASUHIKO * IKEDA;KAZUYUKI * SUGAHARA;SIGERU * KUSUNOKI;KYUSAKU * NISHIOKA |
分类号 |
H01L21/285;H01L21/331;H01L29/73;(IPC1-7):H01L29/08;H01L21/22;H01L29/72 |
主分类号 |
H01L21/285 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|