发明名称 Bipolar transistor
摘要 A bipolar transistor in which a collector layer 35, a base layer 34 and an emitter layer 33 are transversely arranged in sequence through a monocrystal silicon layer formed on an insulation layer of a semiconductor substrate. The transistor may be fabricated by transverse diffusion in sequence from a hole in part of the silicon layer. The structure reduces parasitic capacity between base and collector, and removes p-n junction capacity between the collector and substrate to achieve high-speed operation. <IMAGE>
申请公布号 GB2198285(A) 申请公布日期 1988.06.08
申请号 GB19870025631 申请日期 1987.11.02
申请人 * MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 TASUHIKO * IKEDA;KAZUYUKI * SUGAHARA;SIGERU * KUSUNOKI;KYUSAKU * NISHIOKA
分类号 H01L21/285;H01L21/331;H01L29/73;(IPC1-7):H01L29/08;H01L21/22;H01L29/72 主分类号 H01L21/285
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