| 摘要 |
An exposure apparatus for exposing in a step-and-scan manner a plate-like member to a pattern with radiation so that images of the pattern are transferred onto different regions on the plate-like member. The apparatus includes a mirror imaging optical system for projecting the image of the pattern onto the plate-like member, a carriage for scanningly moving, at the time of exposure, the plate-like member relative to the mirror imaging system, and a stage movably mounted on the carriage for step-feeding the plate-like member at the time of non-exposure so as to sequentially place the different regions of the plate-like member at an exposure station under the mirror imaging system. A locking system is provided to lock the stage relative to the carriage by use of vacuum, at the time of exposure, whereby unwanted displacement of the plate-like member relative to the carriage at the time of scanning exposure is prevented. Also, any positional deviation which may be caused by the locking of the stage is compensated for, by controlling supply of air pressure to linear air-bearings supporting the carriage.
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