发明名称 CONTINUOUS ELECTROLYTIC POLISHING DEVICE
摘要 PURPOSE:To prevent the deterioration of a metallic strip due to the temp. increase of the strip and the impurities in an electrolytic polishing soln. by providing a conductor roll and a cover surrounding the roll and having a slit to the wall of an electrolytic polishing bath housing a guide roll and an electrode. CONSTITUTION:The guide rolls 5a and 5b and a couple of cathodes 4 are arranged in the electrolytic polishing bath 2 charging the electrolytic polishing soln. 6, a metallic strip 1 is conveyed, and the metallic strip 1 is made into an anode by feeders 8a and 8b through at least one between the conductor rolls 3a and 3b provided to the bath wall. In the continuous electrolytic polishing device of such a structure, the conductor roll covers 9a and 9b surrounding the conductor rolls 3a and 3b and having a couple of slits 12 are provided to the bath wall. The electrolytic polishing soln. 6 leaking out from the slit 12 is discharged along with the dissolved impurities by a pump 11b through reserve vessels 10a and 10b. Consequently, the temp. of the metallic strip 1 passing through the inside of the electrolytic polishing soln. 6 is hardly increased, and the drying the sticking of the electrolytic polishing soln. 6 can be avoided.
申请公布号 JPS63134700(A) 申请公布日期 1988.06.07
申请号 JP19860278877 申请日期 1986.11.25
申请人 KAWASAKI STEEL CORP 发明人 KOBAYASHI YASUHIRO;SUJITA SHIGEKO;IGUCHI MASAO;NISHIIKE UJIHIRO;SUZUKI KAZUHIRO
分类号 C25F7/00 主分类号 C25F7/00
代理机构 代理人
主权项
地址