发明名称 CHEMICAL COPPER PLATING SOLUTION
摘要 PURPOSE:To provide fine-grained copper films causing no cracking to through holes, etc., by chemical plating by adding a carboxylic acid other than formic acid to a chemical copper plating soln. contg. formaldehyde. CONSTITUTION:A proper amt. of a carboxylic acid other than formic acid, e.g., acetic acid is added to a chemical copper plating soln. contg. formaldehyde as an essential component. A fine-grained copper film having satisfactory physical properties is obtd. by chemical plating with the resulting plating soln. When the plating soln. is used to plate the through holes in a printed circuit board, a high density printed circuit board having a high degree of integration can be obtd.
申请公布号 JPS63134670(A) 申请公布日期 1988.06.07
申请号 JP19860278705 申请日期 1986.11.25
申请人 FUJITSU LTD 发明人 HYODO KIYOSHI;AEBA KEIJI;TSURU KAZUTO;AMADA TOYOMITSU
分类号 C23C18/40;H05K3/18;H05K3/42 主分类号 C23C18/40
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