| 摘要 |
PURPOSE:To prevent damage to a photomask and a substrate by forming a metallic film to both faces of the substrate prior to the photolithography process so as to decrease static electricity caused due to the temperature rise/decrease attended with a pre-bake or post-bake. CONSTITUTION:Prior to the pre-bake process, a metallic film 2 and an electrode layer 3 are formed to both faces of a substrate 1. Since the partial existence of electric charges generated in the substrate 1 generated in substrate 1 in the heat of the pre-bake process is canceled by a metallic plate 2 and an electrode film 3, the generation of static electricity is suppressed, no photomask 5 is attracted to the substrate 1 in the succeeding exposure process and the damage to the photomask 5 and the substrate 1 is prevented. Since the production of static electricity is suppressed in the succeeding post-bake process, dust floating in air is not stuck to the substrate 1 during the manufacture process.
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