发明名称 METHOD AND DEVICE FOR COATING
摘要 PURPOSE:To permit easy removal of a coating material creeping onto a protective film on the rear face of a material to be coated after spin coating of the coating material when the protective film is removed by preliminarily forming the protective film on the rear face of material to be coated. CONSTITUTION:While the material 1 (e.g., wafer) to be coated is rotated, the protective film 8 (e.g., resin film) is formed via a nozzle 9 on the rear face of the material 1. The coating material 12a (e.g., polyimide) is then supplied from a nozzle 13 onto the surface of the material 1 and the material 1 is rotated, by which the material 12a is coated on the front face of the material 1. The material 12a creeps onto the protective film 8 on the rear face of the material 1 at this time. A removing liquid (e.g., developing soln.) is then sprayed from a nozzle 17 toward the protective film 8 in order to remove the film 8 while the material 1 is kept rotating. The creeping material 12b is thus removed by removing the film 8 in the above-mentioned manner.
申请公布号 JPS63134076(A) 申请公布日期 1988.06.06
申请号 JP19860278563 申请日期 1986.11.25
申请人 TOSHIBA CORP 发明人 TARUI ATSUSHI
分类号 H01L21/31;B05C11/08;B05D1/40;G03F7/16;H01L21/027;H01L21/30 主分类号 H01L21/31
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